ramp rate造句

• Market power analysis considering ramp rate constraint in electricity market
  电力市场中考虑发电机组功率速度约束的市场力分析
• As with balling , the solution to solder beading occurring during the rts profile is to raise the ramp rate until the problem is resolved
  和解决锡球的方法一样，在rts曲线中将升温斜率适当的升高直到解决问题。
• Soft - start is programmed with an external capacitor , which sets the input current ramp rate . in shutdown mode , current consumption is reduced to 0 . 1 a
  本文根据与某境外上市公司的项目合作要求,分析、设计了一款高效电流型升压直流转换器。
• In model , the fare of agc regulation be accounted for in the objective function to achieve the least total purchase cost and the problem solution respects generator constraints , such as ramp rate limits and agc regulation capacity constraints
  本文正是基于上述两点考虑，提出了一种计及agc调节容量的机组组合优化模型。模型中考虑了agc的上调、下调费用和机组的agc调节容量约束，从而达到系统购电总成本最小化。
• We have studied the influence of growth parameters of buffer layer under large flux of reactant materials and found that parameters such as v / ratio , growth temperature and ammonia flux during annealing have evident influences on the growth of buffer layer , while other parameters like growth pressure , pressure during annealing and ramping rate show little influence
  在大源流量流下，研究了gan缓冲层各生长参数的影响规律，发现对缓冲层生长影响显著的条件有生长比、生长温度、退火时的氨气流量。而缓冲层生长压力、退火压力及退火时间的影响相对较小。
• We primarily do theses works : first , for the rtcvd equipment that we required has a big chamber , high working temperature and fast temperature ramp rate , the energy that required for the high temperature working conditions was computed ; then the reflector material and the shape of the reflector were chosen . through computer simulation we designed a reflector that can reflect the energy of each lamp individually through each half - cylindrical - face
  针对本课题要求的rtcvd设备的反应腔大、工作温度高和升温速度快的特点，首先对设备升温条件进行能量计算；接着从反射腔材料选择和形状设计等方面出发，利用计算机模拟最终设计出为每根灯管分别反射辐射能的圆柱面形反射罩。
• In experiments carried out under small reactant source flux , it was found that parameters such as v / ratio , growth pressure , thickness of buffer layer , ammonia flux during annealing and ramping rate have strong influence on the growth of buffer layer , while the influence of tmga flux and pressure during annealing can be omitted
  在小反应源气流下，发现对缓冲层生长影响显著的条件包括生长比，生长压力，缓冲层厚度，退火时氨气流量及退火速率。而ga源流量，退火压力及的影响相对较小。